doi:10.3850/978-981-07-0319-6_200


Solid-State Nanopore Array Membranes Patterned by Electron Beam Lithography, Nanosphere Lithography and Aluminum Anodization


S.Wu1, M. J. K. Klein1,2, O. Vazquez-Mena1, V. Auzelyte1, V. Savu1, N. Blondiaux2, F. Montagne2,
H. Heinzelmann2, R. Pugin2 and J. Brugger1

1Microsystems Laboratory, Ecole Polytechnique Fédérale de Lausanne (EPFL), 1015, Lausanne, Switzerland

2Swiss Center for Eletronics and Microtechnology (CSEM SA), Nanotechnology and Life Sciences Division, Jaquet-Droz 1, Case Postale, CH-2002, Neuchâtel, Switzerland

ABSTRACT

We present the fabrication of thin membranes with dense arrays of nanometer and submicrometer pore arrays by the integration of standard micromachining with three pore patterning techniques: electron beam lithography (EBL), nanosphere lithography (NSL) and aluminum anodization. Using a serial top-down EBL technique we exploit a fine size, positioning and flexibility of this tool. NSL and aluminum anodization, as self-organized bottom-up processes, guaranties cost efficiency and throughput. In our work, we have fabricated silicon nitride (SiN) and alumina (Al2O3) membranes with a thickness down to 100 nm, side length ranging from 200 μm up to 2.4 mm and pore size ranging from 20 nm to 500 nm.

Keywords: Solid-state nanopore array membranes, Electron Beam Lithography (EBL), Nanosphere Lithography (NSL), Aluminum anodization, Microfabrication.

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