Proceedings of the
9th International Conference of Nanomanufacturing (nanoMan2024)
December 1 – 4, 2024, Singapore
Model-independent Wavefront Aberration Measurement of Multi-surface Optical Systems
State Key Laboratory of Precision Measuring Technology & Instruments, Laboratory of Micronano Manufacturing Technology, Tianjin University, Tianjin, China.
ABSTRACT
Wavefront aberration is commonly used to evaluate the performance of optical systems. The phase-assisted wavefront aberration measurement method has been widely applied due to its high precision and strong resistance to environmental disturbances. However, current research on this method generally requires known models of optical systems under test to achieve wavefront reconstruction and system error correction. In this paper, a phase-assisted method with moving screen process is designed to calculate the direction of light rays and complete wavefront reconstruction. Additionally, error correction algorithms are proposed for both focused and afocal optical systems under test. These improvements do not rely on system models, which greatly expands the applicability of the phase-assisted wavefront aberration measurement method. This paper conducts measurements on a focused three-surface optical system and an afocal two-surface optical system, comparing the results with those obtained from the interferometer.
Keywords: Wavefront aberration, Multi-surface optical systems, Phase deflectometry.
