Proceedings of the
9th International Conference of Nanomanufacturing (nanoMan2024)
December 1 – 4, 2024, Singapore
Laser Interference Lithography with a Spatial Light Modulator for Arbitrary Pattern Fabrication
1Graduate School of Engineering, Hokkaido University, Sapporo, Japan 2Division of Mechanical and Aerospace Engineering, Hokkaido University, Sapporo, Japan.
ABSTRACT
A new exposure method for free pattern fabrication combining laser interferometer and wavefront control has been proposed. In conventional Lloyd's mirror interferometric method, two coherent beams are superimposed in a substrate to generate interference fringe patterns. This is known as the simplicity of the principle and high stability to generate high-precision fine patterns even without a well-controlled environment. However, generated interference patterns make it difficult to adjust the position. To improve these problems, a new method of controlling the position of interference fringes by placing a spatial light modulator (SLM) in front of Lloyd's mirror interferometer to apply a phase change to the coherent beam is proposed. In this paper, experimental results about the positioning control of the interference fringes and generating the interference fringes using wavefront control are reported.
Keywords: Laser interference lithography, Lloyd's mirror interferometer, Spatial Light Modulator (SLM), 2D arbitrary fabrication.
