doi:10.3850/978-981-08-6555-9_145

ABSTRACT

In this paper, we describe a new low cost method for manufacturing a micro patterned master for roll-to-roll hot embossing. The goal was to combine the accuracy of photolithographic patterning of SU-8 photoresist on silicon wafers with the mass production capabilities of roll-to-roll hot embossing. This combination was achieved by transferring an SU-8 microstructure on a silicon wafer to a cylindrical embossing roller by means of a two-stage replication process. First, an elastomeric mould with the negative of the SU-8 structures was realized by pouring silicone over the silicon wafer. In a second replication step this silicone mould was used for casting epoxy resin on a blank embossing roller by wrapping the epoxy-filled silicone mould around the roller. In this way a perfect replication of the original SU-8 microstructures was obtained on a cylindrical roller. The side walls of the final replica were as steep as the side walls of the original SU-8 structures and the base of the structure was extremely flat. Thus, both the steepness of the side walls and the flatness of the base were much better than known from conventional metal embossing rollers patterned by laser lithography and subsequent isotropic etching of the metal.

Keywords: Roll-to-roll, Hot embossing, Cylindrical embossing master.

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