Proceedings of the
World Congress on Micro and Nano Manufacturing (WCMNM 2022 )
19–22 September 2022, Lueven, Belgium
doi:10.3850/978-981-18-5180-3_RP33-0048
The Effect of Substrate temperature on Autonomously Generating Micro-Textured Surfaces with Regular Alignment Shapes by Applying Molecular Beam Epitaxy with Helicon Sputtering Molecular Beam Source for Nanoimprint Die
Department of Mechanical Engineering, National Institute of Technology, Tokyo College, Japan
ABSTRACT
The miniaturization and light of various devices, as typified by smartphones, brings convenience to people, including energy savings and so on. To achieve this, mechanical structures must move in the direction of micro and precision. Therefore, the surface is desirable to give the ultra-smooth and/or nano-micro-texture characteristics. However, these surfaces are difficult to generate by using mechanical machining because of their precision and smallness. This study aims to generate nano or micro-textured surfaces by using epitaxial growth process. Molecular Beam Epitaxy (MBE), one of the highly developed epitaxial growth methods, is a technique for growing a thin layer along the crystal axis of the substrate in an ultra-high vacuum environment. In this study, MBE was carried out on a single crystal Si substrate with nano-micro size pre-patterns under the property conditions. On the flat surface during MBE, some regular micro or nano meter size shapes were generated randomly. This study investigated how the surface properties effect of the substrate temperature by using molecular beam sources, such as a Helicon sputtering source in case of Si - Si homo-epitaxial growth.
Keywords: Molecular beam epitaxy, Helicon sputtering, Smooth surface, Nano or micro-textured surface, Nanoimprint die.
Department of Mechanical Engineering, National Institute of Technology, Tokyo College, Japan
ABSTRACT
The miniaturization and light of various devices, as typified by smartphones, brings convenience to people, including energy savings and so on. To achieve this, mechanical structures must move in the direction of micro and precision. Therefore, the surface is desirable to give the ultra-smooth and/or nano-micro-texture characteristics. However, these surfaces are difficult to generate by using mechanical machining because of their precision and smallness. This study aims to generate nano or micro-textured surfaces by using epitaxial growth process. Molecular Beam Epitaxy (MBE), one of the highly developed epitaxial growth methods, is a technique for growing a thin layer along the crystal axis of the substrate in an ultra-high vacuum environment. In this study, MBE was carried out on a single crystal Si substrate with nano-micro size pre-patterns under the property conditions. On the flat surface during MBE, some regular micro or nano meter size shapes were generated randomly. This study investigated how the surface properties effect of the substrate temperature by using molecular beam sources, such as a Helicon sputtering source in case of Si - Si homo-epitaxial growth.
Keywords: Molecular beam epitaxy, Helicon sputtering, Smooth surface, Nano or micro-textured surface, Nanoimprint die.
