Proceedings of the
9th International Conference of Asian Society for Precision Engineering and Nanotechnology (ASPEN2022)
15 – 18 November 2022, Singapore

206 nm All-solid-state Deep-ultraviolet Laser for Addictive Manufacturing

Qiandong Ran and Hao Li1,a

1Advanced Imaging and Machine-vision Group, Singapore Institute of Manufacturing Technology, 2 Fusionopolis Way, Singapore 138634, Singapore


Solid-state ultrafast deep-ultraviolet (DUV) laser sources have improved the average power, peak power, and conversion efficiencies significantly in recent years. Compared with traditional excimer lasers, solid-state DUV lasers have higher peak power, shorter pulse duration, better beam quality and system reliability. These advantages benefit many important scientific and industrial applications such as ultrafast spectroscopy, seeding free-electron lasers, laser additive manufacturing and laser-produced plasma diagnostics. Especially, the fast advances in Yb:YAG laser technology provide much powerful pump sources for DUV laser and boost the related developments recently. However, the power scale-up of solid-state DUV laser is not trivial. Ultrafast solid-state DUV lasers are achieved through frequency up conversions from an infrared pump laser. At low intensity, the conversion efficiency of nonlinear frequency up conversion scales approximately linearly with respect to the incident intensity of the mixing beams. At high intensity, undesirable nonlinear effects such as two-photon absorption (TPA) and self-phase modulation (SPM) result in the eventual saturation of the generated upconverted signal power. In addition, damage to the nonlinear crystals also further limits the incident intensity of the driving laser. Here, we report an all-solid-state DUV laser delivering 0.8 W, 80 µJ, ~582 fs, 206 nm pulses with peak power of 129 MW from a 1030 nm Yb:YAG laser at a 10 kHz repetition rate.

Keywords: Precision machining, DUV, Ultrafast laser

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