Nanoimprint has been receiving attention with increasing demands. However, it is difficult to generate the die due to the small scale. This study aims to generate nano or micro-textured surfaces by using epitaxial growth process for the nanoimprint die. Molecular Beam Epitaxy (MBE), one of the highly-developed epitaxial growth methods, was carried out on mono crystal Si substrate with pre-patterns by photolithography and etching under proper conditions. The pre-patterns consist of concavo-convex line and space, circle, square and so on with micro or nano meter size. On the flat surface during MBE, some regular micro or nano meter size shapes are generated randomly. Furthermore, size and position of these shapes on the surface can be controlled by the pre-patterns allowing the possibility to generate nano-micro textured surfaces with regular alignment shapes by MBE. Therefore, means of generating patterns using various types of pre-patterns to align the position and size were investigated throughout this study.