doi: 10.3850/978-981-11-0749-8_684
Comparison of Scatterometry, Imaging Scatterometry, AFM and Confocal Microscopy
M. H. Madsen1, J. S. Madsen1,2, P. E. Hansen1, P. Boher3, J. Nygård2, D. Dwarakanath4 and J. F. Jørgensen4
1Danish Fundamental Metrology A/S, Matematiktorvet 307, Kgs. Lyngby, Denmark
2Center for Quantum Devices & Nano-Science Center, Niels Bohr Institute, University of Copenhagen, Universitetsparken 5, Copenhagen, Denmark
3ELDIM, 1185 rue d’Epron, 14200 Herouville Saint Clair, France
4Image Metrology A/S, Lyngsø Allé 3A, 2970 Hørsholm, Denmark
Abstract
With new fabrication methods for mass production of nano-textured samples there is an increasing demand for new characterization methods. Conventional microscopes are either too slow and/or too sensitive to vibrations. Scatterometry is a good candidate for in-line measuring in an industrial environment as it is insensitive to vibrations and very fast. However, as it is a non-imaging technique, it can be challenging for the operator to find the area-of-interest on a sample and to detect defects. We have therefore developed the technique imaging scatterometry, in which the user first has to select the area of interest after the data has been acquired. In addition, one is no longer limited to analyze areas equal to the spot size, and areas down to 3 µm × 3 µm can be analyzed. In this paper we present a comparison between scatterometry, the newly developed imaging scatterometry and some state-of-art conventional characterization techniques, atomic force microscopy and confocal microscopy
Keywords: Scatterometry, Confocal Microscopy, AFM, Gratings, Instrument Design.
